Handbook of Semiconductor Manufacturing Technology Editor(s) :Robert Doering, Yoshio Nishi
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ISBN |
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9781574446753 |
Name |
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Handbook of Semiconductor Manufacturing Technology |
Price |
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6000.00 |
Edition |
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2nd Edition |
Editor/s |
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Robert Doering, Yoshio Nishi |
Type |
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Reference Book |
Pages |
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1720 |
Year of Publication |
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Rpt.2014 |
Publisher |
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CRC Press/BSP Books |
Binding |
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Hardback |
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Contents:
1. Introduction to Semiconductor Devices, 2. Overview of Interconnect-Copper and
Low-Κ Integration, 3. Silicon
Materials, 4. SOI Materials and
Devices, 5. Surface Preparation, 6. Supercritical Carbon Dioxide in
Semiconductor Cleaning, 7. Ion
Implantation, 8. Dopant Diffusion, 9. Oxidation and Gate Dielectrics, 10. Silicides, 11. Rapid Thermal Processing,
12. Low-Κ Dielectrics, 13.
Chemical Vapor Deposition, 14. Atomic
Layer Deposition, 15. Physical Vapor
Deposition, 16. Damascene Copper
Electroplating, 17. Chemical-Mechanical
Polishing, 18. Optical Lithography, 19. Photoresist Materials and
Processing, 20. Photomask
Fabrication, 21. Plasma Etch, 22. Equipment Reliability, 23. Overview of Process Control, 24. In-Line Metrology, 25. In-Situ Metrology, 26. Yield Modeling, 27. Yield Management, 28. Electrical, Physical, and Chemical
Characterization, 29. Failure
Analysis, 30. Reliability Physics, 31. Effects of Terrestrial Radiation on
Integrated Circuits, 32. Integrated-Circuit
Packaging, 33. 300 Mm Wafer Fab
Logistics and Automated Material Handling Systems, 34. Factory Modeling, 35.
Economics of Semiconductor Manufacturing |
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